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        JEM-1400Plus型透射電子顯微鏡

        作者:        發布于:2018-05-23
        Img-2018322135247.bmp
         
         
        型號:JEM-1400Plus

        生產國別廠家:日本,日本電子(JEOL

        主要技術指標:

        1、加速電壓:80KV,100KV,120 kV

        2、TEM分辨率:點分辨率:0.38 nm,線分辨率:0.2 nm

        3、STEM分辨率:2.0 nm

        4、束斑尺寸:0.2-6μm

        5、放大倍數:10~120萬倍

         

        基本原理: 利用高能電子束照射厚度不超過100納米的薄的樣品,電子與樣品中的原子碰撞而改變方向,由于樣品厚度、元素組成、晶體結構和缺陷等的不同,透過樣品的電子會產生不同的花樣或圖像襯度,這些花樣或圖像包含了樣品微觀形貌結構的相關信息。

         

        主要用途:主要用于材料的形貌、結構和缺陷的觀察,也可進行物相的鑒定,包括晶胞參數的電子衍射測定。

         

         

        Model: JEM-1400Plus

        Manufacturer: JEOL, Japan

        Main Specifications:

        1. Accelerating Voltage: 80KV,100KV,120 kV

        2. TEM Point Resolution0.38 nm, Lattice Resolution: 0.2 nm

        3.  STEM resolution: 2.0 nm

        4. Spot size0.2-6μm

        5. TEM Magnification: 10~1200k

         

        Principle: High-energy electron beam irradiate thin specimen (thickness no more than 100nm). Electrons collide with atoms of specimen and change directions. For the reason that different specimens have different thickness, element compositions, lattice structure and defects, transmitted electrons will generate different patterns or image contrasts, which contain specimen’s microstructure information and micromorphology information.

         

        Main Application:  This instrument is mainly used for the observation of the morphology, structure and defects of materials, and also for the identification of phases, including the electron diffraction measurement of the unit cell parameters.

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